Ultrathin Hfo2 Gate Dielectric Grown By Plasma-Enhanced Chemical Vapor Deposition Using Hf[Oc(Ch3)3]4 As A Precursor InAbsence of O2 (Record no. 763881)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 00520nab a2200145Ia 4500 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 230808s2003 |||||||f |||| 00| 0 eng d |
| 100 ## - MAIN ENTRY--PERSONAL NAME | |
| Personal name | Choi, Kyu-Jeong |
| 9 (RLIN) | 811374 |
| 245 #0 - TITLE STATEMENT | |
| Title | Ultrathin Hfo2 Gate Dielectric Grown By Plasma-Enhanced Chemical Vapor Deposition Using Hf[Oc(Ch3)3]4 As A Precursor InAbsence of O2 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | 60-65 p. |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Dielectric |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Plasma |
| 9 (RLIN) | 115419 |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Chemical Vapor Deposition (Cvd) |
| 9 (RLIN) | 688088 |
| 773 ## - HOST ITEM ENTRY | |
| Place, publisher, and date of publication | 2003 |
| Title | Journal of Materials Research |
| International Standard Serial Number | 08842914 |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | Articles |
| -- | 51 |
| -- | ABUL KALAM Library |
| Not for loan | Home library | Serial Enumeration / chronology | Total Checkouts | Date last seen | Koha item type |
|---|---|---|---|---|---|
| Engr Abul Kalam Library | Vol.18, No.01 (Jan. 2003) | 19/08/2023 | Articles |