ImprovimgElectrical Integrity of Cu-Cosi2 Contacted N+P Junction Diodes Using Nitrogen-Incorporated Ta Films As A Diffusion Barrier (Record no. 765566)
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000 -LEADER | |
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fixed length control field | 00537nab a2200145Ia 4500 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
fixed length control field | 230808s2002 |||||||f |||| 00| 0 eng d |
100 ## - MAIN ENTRY--PERSONAL NAME | |
Personal name | Yang, Wei-Bin |
9 (RLIN) | 806499 |
245 #0 - TITLE STATEMENT | |
Title | ImprovimgElectrical Integrity of Cu-Cosi2 Contacted N+P Junction Diodes Using Nitrogen-Incorporated Ta Films As A Diffusion Barrier |
300 ## - PHYSICAL DESCRIPTION | |
Extent | 1947-1954 p. |
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Topical term or geographic name entry element | Cobalt Oxides |
9 (RLIN) | 688324 |
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Topical term or geographic name entry element | Copper Conductor |
9 (RLIN) | 813394 |
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Topical term or geographic name entry element | Diffusion Barriers |
9 (RLIN) | 768423 |
773 ## - HOST ITEM ENTRY | |
Place, publisher, and date of publication | 2002 |
Title | Ieee Transactions on Electron Devices |
International Standard Serial Number | 00189383 |
942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
Koha item type | Articles |
-- | 51 |
-- | ABUL KALAM Library |
Not for loan | Home library | Serial Enumeration / chronology | Total Checkouts | Date last seen | Koha item type |
---|---|---|---|---|---|
Engr Abul Kalam Library | Vol.49, No.11 (Nov. 2002) | 19/08/2023 | Articles |