A Study of Interface Trap Generation by Fowler-Nordheim and Substrate-Hot-Carrier Stresses Fo 4-Nm Thick Gate Oxides (Record no. 744910)

MARC details
000 -LEADER
fixed length control field 00598nab a2200169Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230808s1999 |||||||f |||| 00| 0 eng d
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Shiue, Jao-Hsian
9 (RLIN) 776325
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Lee, Joseph Ya-Min
9 (RLIN) 779740
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Chao, Tien-Sheng
9 (RLIN) 779742
245 #2 - TITLE STATEMENT
Title A Study of Interface Trap Generation by Fowler-Nordheim and Substrate-Hot-Carrier Stresses Fo 4-Nm Thick Gate Oxides
300 ## - PHYSICAL DESCRIPTION
Extent 1705-1710 p.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Hot Carrier
9 (RLIN) 767189
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Interface Traps
9 (RLIN) 779743
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Mos Device
9 (RLIN) 768494
773 ## - HOST ITEM ENTRY
Place, publisher, and date of publication 1999
Title IEEE Transactions on Electron Devices
International Standard Serial Number 00189383
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Articles
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-- ABUL KALAM Library
Holdings
Not for loan Home library Serial Enumeration / chronology Total Checkouts Date last seen Koha item type
  Engr Abul Kalam Library Vol.46, No.08 (Aug. 1999)   19/08/2023 Articles