A Comprehensive Study of Hot Carier Stress-Induced Drain Leakage Current Degradation in Thin-Oxide N-Mosfet'S (Record no. 743999)

MARC details
000 -LEADER
fixed length control field 00590nab a2200169Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230808s1999 |||||||f |||| 00| 0 eng d
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Wang, Tahui
9 (RLIN) 777572
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Chiang, Lu-Ping
9 (RLIN) 777573
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Zous, Nian-Kai
9 (RLIN) 777575
245 #2 - TITLE STATEMENT
Title A Comprehensive Study of Hot Carier Stress-Induced Drain Leakage Current Degradation in Thin-Oxide N-Mosfet'S
300 ## - PHYSICAL DESCRIPTION
Extent 1877-1882 p.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Drain Leakge Degradation
9 (RLIN) 777577
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Hot Carrier
9 (RLIN) 767189
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Thin Oxide
9 (RLIN) 771943
773 ## - HOST ITEM ENTRY
Place, publisher, and date of publication 1999
Title IEEE Transactions on Electron Devices
International Standard Serial Number 00189383
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Articles
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-- ABUL KALAM Library
Holdings
Not for loan Home library Serial Enumeration / chronology Total Checkouts Date last seen Koha item type
  Engr Abul Kalam Library Vol.46, No.09 (Sep. 1999)   19/08/2023 Articles