A Simulation Study of Long Throw Sputtering for Diffusion Barrier Deposition Into High Aspect Vias and Contacts (Record no. 743547)

MARC details
000 -LEADER
fixed length control field 00606nab a2200169Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230808s1998 |||||||f |||| 00| 0 eng d
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Smyth, T.
9 (RLIN) 776386
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Tan, liang
9 (RLIN) 776387
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Chan, K.
9 (RLIN) 326868
245 #2 - TITLE STATEMENT
Title A Simulation Study of Long Throw Sputtering for Diffusion Barrier Deposition Into High Aspect Vias and Contacts
300 ## - PHYSICAL DESCRIPTION
Extent 1414-1425 p.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Integrated Circuit Metalilzation
9 (RLIN) 768476
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Semiconductor Process Modeling
9 (RLIN) 776391
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Simulation
9 (RLIN) 2549
773 ## - HOST ITEM ENTRY
Place, publisher, and date of publication 1998
Title IEEE Transactions on Electron Devices
International Standard Serial Number 00189383
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Articles
-- 51
-- ABUL KALAM Library
Holdings
Not for loan Home library Serial Enumeration / chronology Total Checkouts Date last seen Koha item type
  Engr Abul Kalam Library Vol.45, No.07 (Jul. 1998)   19/08/2023 Articles