Thermally Robust Hfn Metal As A Promising Gate Electrode for Advanced Mos Device Applications
Yu Yu, Hong Li, Ming-Fu
Thermally Robust Hfn Metal As A Promising Gate Electrode for Advanced Mos Device Applications - 609-615 p.
Cmos Device
Hfn
Metal Gate
Thermally Robust Hfn Metal As A Promising Gate Electrode for Advanced Mos Device Applications - 609-615 p.
Cmos Device
Hfn
Metal Gate