| 000 | 00555nab a2200181Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s2002 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aEarles, S _9822263 |
||
| 100 |
_aLaw, M _9822265 |
||
| 100 |
_aBrindos, R _9822266 |
||
| 100 |
_aJones, K _9822267 |
||
| 245 | 0 | _aNonmelt Laser Annealing of 5-Ke V and 1-Ke V Boron-Implanted Silicon | |
| 300 | _a1118-1123 p. | ||
| 650 |
_aBoron _9404074 |
||
| 650 |
_aHeavily Doped _9779967 |
||
| 650 |
_aLaser Annealing _9775474 |
||
| 773 |
_d2002 _tIeee Transactions on Electron Devices _x00189383 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c772956 _d772956 |
||