| 000 | 00569nab a2200157Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s1998 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aWang, Tahui _9777572 |
||
| 100 |
_aChing, Lu-Ping _9780281 |
||
| 100 |
_aHuang, Chimoon _9780283 |
||
| 245 | 0 | _aCharacterization of Various Stress-Induced Oxide Traps in Mosfet'S by Using a Subthreshold Transient Current Technique | |
| 300 | _a1791-1796 p. | ||
| 650 |
_aCharacte Regognition _9677235 |
||
| 650 |
_aVarious Implant Types _9780285 |
||
| 773 |
_d1998 _tIEEE Transactions on Electron Devices _x00189383 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c745150 _d745150 |
||