| 000 | 00598nab a2200169Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s1999 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aShiue, Jao-Hsian _9776325 |
||
| 100 |
_aLee, Joseph Ya-Min _9779740 |
||
| 100 |
_aChao, Tien-Sheng _9779742 |
||
| 245 | 2 | _aA Study of Interface Trap Generation by Fowler-Nordheim and Substrate-Hot-Carrier Stresses Fo 4-Nm Thick Gate Oxides | |
| 300 | _a1705-1710 p. | ||
| 650 |
_aHot Carrier _9767189 |
||
| 650 |
_aInterface Traps _9779743 |
||
| 650 |
_aMos Device _9768494 |
||
| 773 |
_d1999 _tIEEE Transactions on Electron Devices _x00189383 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c744910 _d744910 |
||