| 000 | 00590nab a2200169Ia 4500 | ||
|---|---|---|---|
| 008 | 230808s1999 |||||||f |||| 00| 0 eng d | ||
| 100 |
_aWang, Tahui _9777572 |
||
| 100 |
_aChiang, Lu-Ping _9777573 |
||
| 100 |
_aZous, Nian-Kai _9777575 |
||
| 245 | 2 | _aA Comprehensive Study of Hot Carier Stress-Induced Drain Leakage Current Degradation in Thin-Oxide N-Mosfet'S | |
| 300 | _a1877-1882 p. | ||
| 650 |
_aDrain Leakge Degradation _9777577 |
||
| 650 |
_aHot Carrier _9767189 |
||
| 650 |
_aThin Oxide _9771943 |
||
| 773 |
_d1999 _tIEEE Transactions on Electron Devices _x00189383 |
||
| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c743999 _d743999 |
||