| 000 | 00626nab a2200169Ia 4500 | ||
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| 008 | 230808s2000 |||||||f |||| 00| 0 eng d | ||
| 100 |
_alin, Shih-Chieh _9768478 |
||
| 100 |
_aKuo, James B. _977748 |
||
| 100 |
_aSun, Shih-Wei _9768479 |
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| 245 | 2 | _aA Closed- Form Back-Gate-Bias Related Inverse Narrow-Channel Effect Model for Deep-Submicron Vlsi Cmos Devices Using Shaliow Trench Isolation | |
| 300 | _a725-733 p. | ||
| 650 |
_aSti _9714005 |
||
| 650 |
_aCon Formal Mapping _9768481 |
||
| 650 |
_aInverse Narrowchannel Effect _9768483 |
||
| 773 |
_d2000 _tIEEE Transactions on Electron Devices _x00189383 |
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| 942 |
_cART _o51 _pABUL KALAM Library |
||
| 999 |
_c740363 _d740363 |
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