000 00418nab a2200133Ia 4500
008 230808s2007 |||||||f |||| 00| 0 eng d
100 _aMastropaolo, E.
_9765736
245 0 _aReactive Ion Etching of Zinc Oxide (Zno) in Sici4 Based Plasmas
300 _a1467-1468 p.
650 _aSemiconductor Technology
_9756520
650 _aOxide
_983600
773 _d2007
_tIET:Iee: Electronics Letters
_x00135194
942 _cART
_o51
_pABUL KALAM Library
999 _c739114
_d739114