Suppression of Sin-Induced Boron Penetration By Using Sih-Free Silicon Nitride Films for med By Terachlorosilane and Ammonia

By: Material type: ArticleArticleDescription: 1526-1531 pSubject(s): In: Ieee Transactions on Electron Devices
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Articles Articles Periodical Section Vol.49, No.09 (Sep. 2002) Available