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Gaas-Misfets with Insuling Gate Films for med By Direct Oxidatio N and By Oxinitridation of Recesses Gaas Surfaces by
  • Takebe, Masahide
  • Nakamura, Kazuki
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
The Effect of Annealing Temperatures on Self-Ailned Replacement (Damascene) Tacn-Tan-Stacked Gate Pmosfets by
  • Pan, J
  • Woo, Christy
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Thermally Robust Hfn Metal As A Promising Gate Electrode for Advanced Mos Device Applications by
  • Yu Yu, Hong
  • Li, Ming-Fu
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Self-Aligned Nickel Cobalt Tantalum Nitride Stacked -Gate Pmosfets Fabricated with Low Temperature Process after Metal Electrode Deposition by
  • Woo, James Pan
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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