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Interface Properties of No-Annealed N2o-Grown Oxynitride by
  • Lai, P. T
  • Xu, J.P
  • Cheng, Y.C
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Ultrathin Al203 and Hfo2 Gate Dielectrics on Surface - Nitrided Ge by
  • Chen, Jiunn-Tsair
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Fermi-Level Pinning AtPolysilicon/Metal -Oxide Interface - Part Ii by
  • Hobbs, Christopher C
  • Fonseca, Leonardo R.C
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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