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Simulation on Surface Tracking Pattern UsingDielectric Beealdown Model by
  • Kim, Jun-Won
  • Roh, Young-Su
Source: Journal of Electrical Engineering and Technology
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Dielectric Breakdown Mechanism of Thin-Sio2 Studied byPost-Breakdown Resistance Statistics by
  • Satake, Hideki
  • Toriumi, Akira
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Soft Breakdon Conduction in Ultrathin (3-5 Nm) Gate Dielectrics by
  • Miranda, Enrique
  • Sune, Jordi
  • Campabadal, Francesca
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
AssessingReliability of Silicon Nitride Capacitors in a Gaas Ic Process by
  • Yeats, Bob
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
A New Soft Breakdown Model for Thin Thermal Sio2 Films Under Constant Current Stress by
  • Tomita, T
  • Sakurai, T
  • Taniguchi, Kenji
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Correlation Between Two Time-Dependent Dielectric Breakdown Measurements for Gate Oxides Damaged by Plama Processing by
  • Eriguchi, Koji
  • Kosaka, Yukiko
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Trapped Charge Distributions in Thin (10nm) Sio2 Films Subected to Static and Dynamic Stresses by
  • Rodriguez, R
  • Nafria, M
  • Aymerich, X
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Simulation of Degradation of Dielectric Breakdown Field of Thermal Sio2 Films Due to Voids Si Wafers by
  • Satoh, Yuhki
  • Shiota, Takaaki
  • Furuya, Hisashi
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Electrical Conduction and Dielectric Breakdown in Aluminum Oxide Insulators on Silicon by
  • Kolodzey, James
  • Chen, Shong-Chin
  • Olowolafe, Johnson Olufemi
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Impact of Correlated Generation of Oxide Defects on Silc and Breakdown Distributions by
  • Ielmini, Daniele
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Integration and Reliability of Cu-Sioc Interconnect for Arf/90-Nm Node Cmos Technology by
  • Noguchi, Junji
  • Oshima, Takayuki
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Hot-Hole-Induced Dielectric Breakdown in Ldmos Transistors by
  • Labate, Lorenzo
  • Manzini, Stefano
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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