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A Study of Interface Trap Generation by Fowler-Nordheim and Substrate-Hot-Carrier Stresses Fo 4-Nm Thick Gate Oxides by
  • Shiue, Jao-Hsian
  • Lee, Joseph Ya-Min
  • Chao, Tien-Sheng
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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Cotio3 High-K Dielectrics on Hsg for Dram Applications by
  • Chao, Tien-Sheng
  • Ku, Wei-Ming
Source: Ieee Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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