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Interface Trap Generation by Fn Injection Under Dynamic Oxide Field Stress by
  • Chen, T.P
  • Lo, K. F
  • li, Stelia
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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Post-Stress Trap Generation Induced by Oxide-Field Stress with Fn Injection by
  • Chen, T.P
  • li, Stelia
  • Fung, S
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Request article
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