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A Comprehensive Study of Hot Carier Stress-Induced Drain Leakage Current Degradation in Thin-Oxide N-Mosfet'S by
  • Wang, Tahui
  • Chiang, Lu-Ping
  • Zous, Nian-Kai
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Investigation of Oxide Charge Trapping and Detrapping in a Mosfet by Using a Gldl Current Technique by
  • Wang, Tahui
  • Chang, Tse-En
  • Bess, Vicki
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
Characterization of Various Stress-Induced Oxide Traps in Mosfet'S by Using a Subthreshold Transient Current Technique by
  • Wang, Tahui
  • Ching, Lu-Ping
  • Huang, Chimoon
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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