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Impact of Scaling Silicon Film Thickness and Channel Width on Soi Mosfedt with Reoxidized Mesa Isolation by
  • Fung, Samuel K. H
  • Chan, Mansun
  • Ko, Pink K
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
A Unified Understanding on Fuliy-Depleted Soi Nmosfet Hot-Carrier Degradation by
  • Banna, Srinivasa R
  • Chan, Philip C. H
  • Fung, Samuel K. H
Source: IEEE Transactions on Electron Devices
Material type: Article Article; Format: print
Availability: Items available for loan: Engr Abul Kalam Library (1).
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