The Combined Effects of Deuterium Anneals and Deuterated Barrier-Nitride Processing on Hot-Electron Degradation in Mosfet'S

By: Material type: ArticleArticleDescription: 747-753 pSubject(s): In: IEEE Transactions on Electron Devices
Holdings
Item type Current library Call number Vol info Status Date due Barcode
Articles Articles Periodical Section Vol.46, No.04 (Apr. 1999) Available