Yeh, Kuo-Lang Jeng, Ming-Jer Hwu, Jenn-Gwo <br/><br/>
Effect of Oxidation Pressure onCharacteristics of Fluorinated Thin Gate Oxides Prepared By Room Temperature Deposition Followed By Rapid Thermal Oxidation 

 - 539-545 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Liquid Phase Deposition<br/>Rapid Thermal Oxidation<br/>Oxide Breakdown Field