TY  - SER
AU  - Choi, Kyu-Jeong
TI  - Ultrathin Hfo2 Gate Dielectric Grown By Plasma-Enhanced Chemical Vapor Deposition Using Hf[Oc(Ch3)3]4 As A Precursor InAbsence of O2
KW  - Dielectric
KW  - Plasma
KW  - Chemical Vapor Deposition (Cvd)
ER  -