TY  - SER
AU  - Tatsuyuki, Saito
AU  - Ashihara, Hiroshi
TI  - A Reliability of Barrier-Metal-Clad Copper Interconnects with Self-Aligned Metallic Caps
KW  - Chemical Vapor Deposition (Cvd)
KW  - Copper Losses
KW  - Electromigration
ER  -