Yanagisawa, Masaki Kotani, Koji <br/><br/>
A Robust All-Wet-Etching Process  for  Mesa  for mation of Ingaas-Inp Hbt Featuring High Uni for mity and High Reproducibility 

 - 1234-1240 p. 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Heterojunction Bipolar Transistor (Hbt)<br/>High-Speed Electronic