Low-Frequency Noise in Submicrometer Mosfets with Hfo2, Hfo2/Al2o3 and Hfalo Gate Stacks

By: Material type: ArticleArticleDescription: 1679-1687 pSubject(s): In: Ieee Transactions on Electron Devices
Holdings
Item type Current library Call number Vol info Status Date due Barcode
Articles Articles Periodical Section Vol.51, No.10 (Oct. 2004) Available