Effect of Oxidation Pressure onCharacteristics of Fluorinated Thin Gate Oxides Prepared By Room Temperature Deposition Followed By Rapid Thermal Oxidation (Record no. 800908)

MARC details
000 -LEADER
fixed length control field 00675nab a2200169Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230808s1998 |||||||f |||| 00| 0 eng d
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Yeh, Kuo-Lang
9 (RLIN) 859764
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Jeng, Ming-Jer
9 (RLIN) 776302
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Hwu, Jenn-Gwo
9 (RLIN) 776300
245 #0 - TITLE STATEMENT
Title Effect of Oxidation Pressure onCharacteristics of Fluorinated Thin Gate Oxides Prepared By Room Temperature Deposition Followed By Rapid Thermal Oxidation
300 ## - PHYSICAL DESCRIPTION
Extent 539-545 p.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Liquid Phase Deposition
9 (RLIN) 701039
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Rapid Thermal Oxidation
9 (RLIN) 859765
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Oxide Breakdown Field
9 (RLIN) 859766
773 ## - HOST ITEM ENTRY
Place, publisher, and date of publication 1998
Title Proceedings ofNational Science Council, Republic of China
International Standard Serial Number 02556588
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Articles
-- 51
-- ABUL KALAM Library
Holdings
Not for loan Home library Serial Enumeration / chronology Total Checkouts Date last seen Koha item type
  Engr Abul Kalam Library Vol.22, No.04 (Jul. 1998)   20/08/2023 Articles