Rapid Thermal Anneal of Gate Oxides for Low Thermal Budget Tft'S (Record no. 744126)

MARC details
000 -LEADER
fixed length control field 00529nab a2200169Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230808s1999 |||||||f |||| 00| 0 eng d
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Bhat, Navakanta
9 (RLIN) 777901
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Wang, Albert W.
9 (RLIN) 777902
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name SARaswat, Krishna C.
9 (RLIN) 768498
245 #0 - TITLE STATEMENT
Title Rapid Thermal Anneal of Gate Oxides for Low Thermal Budget Tft'S
300 ## - PHYSICAL DESCRIPTION
Extent 63-69 p.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Rapid Thermal
9 (RLIN) 776304
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Gate Oxide
9 (RLIN) 777258
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Budget
773 ## - HOST ITEM ENTRY
Place, publisher, and date of publication 1999
Title IEEE Transactions on Electron Devices
International Standard Serial Number 00189383
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Articles
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-- ABUL KALAM Library
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  Engr Abul Kalam Library Vol.46, No.01 (Jan. 1999)   19/08/2023 Articles