Reactive Ion Etching of Zinc Oxide (Zno) in Sici4 Based Plasmas (Record no. 739114)

MARC details
000 -LEADER
fixed length control field 00418nab a2200133Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230808s2007 |||||||f |||| 00| 0 eng d
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Mastropaolo, E.
9 (RLIN) 765736
245 #0 - TITLE STATEMENT
Title Reactive Ion Etching of Zinc Oxide (Zno) in Sici4 Based Plasmas
300 ## - PHYSICAL DESCRIPTION
Extent 1467-1468 p.
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Semiconductor Technology
9 (RLIN) 756520
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Oxide
9 (RLIN) 83600
773 ## - HOST ITEM ENTRY
Place, publisher, and date of publication 2007
Title IET:Iee: Electronics Letters
International Standard Serial Number 00135194
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Articles
-- 51
-- ABUL KALAM Library
Holdings
Not for loan Home library Serial Enumeration / chronology Total Checkouts Date last seen Koha item type
  Engr Abul Kalam Library Vol.43, No.25 (Dec. 2007)   19/08/2023 Articles