Thickness Dependent Dielectric Breakdown of Pecvd Low-K Carbon Doped Silicon Dioxide Dielectric Thin Films: Modeling and Experiments

Zhou, H Shi, F.G. Zhao, Banghua

Thickness Dependent Dielectric Breakdown of Pecvd Low-K Carbon Doped Silicon Dioxide Dielectric Thin Films: Modeling and Experiments - 259-264 p.


Thickness Dependent
Dielectric
Plasma